were required. In a sample of 200 units, 26 required reworking of the photolithographic step. Following training in the use of Pareto charts and other approaches to identify significant problems, improvements were made. A new sample of size 200 had only 12 that needed rework. Find a large sample 99% confidence interval for the true difference of the proportions.
were required. In a sample of 200 units, 26 required reworking of the photolithographic step. Following training in the use of Pareto charts and other approaches to identify significant problems, improvements were made. A new sample of size 200 had only 12 that needed rework. Find a large sample 99% confidence interval for the true difference of the proportions.
Database System Concepts
7th Edition
ISBN:9780078022159
Author:Abraham Silberschatz Professor, Henry F. Korth, S. Sudarshan
Publisher:Abraham Silberschatz Professor, Henry F. Korth, S. Sudarshan
Chapter1: Introduction
Section: Chapter Questions
Problem 1PE
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100%
Photolithography plays a central role in manufacturing integrated circuits made
on thin disks of silicon. Prior to a quality-improvement program, too many rework operations
were required. In a sample of 200 units, 26 required reworking of the photolithographic step.
Following training in the use of Pareto charts and other approaches to identify significant
problems, improvements were made. A new sample of size 200 had only 12 that needed
rework.
Find a large sample 99% confidence interval for the true difference of the
proportions.
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