6.65. (a) Thirty observations on the oxide thickness of individual silicon wafers are shown in Table 6E.23. Use these data to set up a control chart on oxide thickness and a moving range chart. Does the process exhibit statistical control? Does oxide thickness follow a normal distribution? (b) Following the establishment of the control charts in part (a), 10 new wafers were observed. The oxide thickness measurements are as follows: Oxide Thickness Oxide Thickness Wafer Wafer 54.3 6 51.5 2 57.5 58.4 3 64.8 8 67.5 4 62.1 9. 61.1 5 59.6 10 63.3
6.65. (a) Thirty observations on the oxide thickness of individual silicon wafers are shown in Table 6E.23. Use these data to set up a control chart on oxide thickness and a moving range chart. Does the process exhibit statistical control? Does oxide thickness follow a normal distribution? (b) Following the establishment of the control charts in part (a), 10 new wafers were observed. The oxide thickness measurements are as follows: Oxide Thickness Oxide Thickness Wafer Wafer 54.3 6 51.5 2 57.5 58.4 3 64.8 8 67.5 4 62.1 9. 61.1 5 59.6 10 63.3
Mathematics For Machine Technology
8th Edition
ISBN:9781337798310
Author:Peterson, John.
Publisher:Peterson, John.
Chapter29: Tolerance, Clearance, And Interference
Section: Chapter Questions
Problem 16A: Spacers are manufactured to the mean dimension and tolerance shown in Figure 29-12. An inspector...
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